Radio Frequency Sputtering 

Type: LAB line Sputter 5

Manufacturer: Kurt J Lesker (USA)

•Cylindrical 304L Stainless Steel chamber optimized for UHV Magnetron Sputtering processes •Chamber design is optimized for confocal sputtering source arrangement, compatible with UHV pressure regime, and allows convenient access through top-plate for target change and maintenance •Base pressure for a properly conditioned chamber is 9 x 10-9 Torr •Nude ion gauge and convection gauge read from atmosphere to 10-10 Torr