FOCUSED LON/EIECTRON DUALBEAM SYSTEM

Focused ion beam is applied to micro-nano processing, micro-nanostructure observation and analysis, high-quality site-specific transmission electron  microscope sample preparation, atom probe specimen preparation,  automatic sequence EBSD sample preparation, integrated circuit repair and  tomography. Functions that can be realized include ion beam etching, ion beam deposition, electron beam deposition, electron beam exposure processing for nanostructures, and high-resolution scanning electron microscope function for   real-time observation of ion beam processing samples. The electron beam can   reach a resolution of 0.9 nm at 15 kV, and the ion beam can reach a resolution of   2.5 nm at 30 kV.